Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brightener and cleaning agent. It is also involved in the purification of some metallic elements.

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