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Tetrakis(dimethylamino)silane, 99%, Thermo Scientific Chemicals
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Catalog number H27092.03
also known as H27092-03
Price (USD)/ Each
35.80
-
Quantity:
1 g
Price (USD)/ Each
35.80
Tetrakis(dimethylamino)silane, 99%, Thermo Scientific Chemicals
Catalog numberH27092.03
Price (USD)/ Each
35.80
-
Chemical Identifiers
CAS1624-01-7
Specifications
Specification Sheet
Specification SheetAppearance (Color)Clear colorless
FormLiquid or low-melting solid (clear liquid as melt)
Assay (GC)≥98.5%
Proton NMRConforms to structure
Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Applications
Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
Solubility
Reacts with water.
Notes
Moisture Sensitive. Store in cool place. Keep container tightly closed in a dry and well-ventilated place. Store away from strong oxidizing agents, water, moisture.
Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
Solubility
Reacts with water.
Notes
Moisture Sensitive. Store in cool place. Keep container tightly closed in a dry and well-ventilated place. Store away from strong oxidizing agents, water, moisture.
RUO – Research Use Only
General References:
- Toshiro Maruyama,; Toshimasa Shirai. Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone. Appl. Phys. Lett. 1993, 63(5),611.
- Y. W. Bae,; W. Y. Lee,; T. M. Besmann,; P. J. Blau.Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia. Appl. Phys. Lett. 1995 , 66(15) , 1895.