Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanoparticle aggregation. It finds application in thermochemolysis, an analytical technique involving both pyrolysis and chemical derivatization of the analyte.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.